etching n. 1.蝕刻法;蝕刻(銅)版畫;蝕鏤術(shù)。 2.蝕刻畫,蝕刻版,蝕刻版印刷品。 close [rough] etching (晶體的)精[粗]蝕。 electrochemical etching 電化浸蝕,電拋光。
reactor n. 1.反應(yīng)者,被試驗(yàn)者;【醫(yī)學(xué)】有(陽性)反應(yīng)的人[動物]。 2.【電學(xué)】礙圈,扼流圈;電抗器;【化學(xué)】反應(yīng)器;【物理學(xué)】反應(yīng)堆。 a fast reactor 快中子反應(yīng)堆。
The etching reactor is developed to obtain reproducible tapers of desired diameter and length . an approach for on - line monitoring of etching using the power meter is demonstrated . based on the experimental data , the relationship between the leak - out optical power and change of time and also that between the leak - out power and width of the remaining width of cladding , and the fiber length exposed to hf acid are summarized 本文對氫氟酸腐蝕法制作光纖耦合器的反應(yīng)裝置和實(shí)驗(yàn)系統(tǒng)進(jìn)行了設(shè)計(jì),介紹了具體的實(shí)驗(yàn)過程及其注意事項(xiàng),通過對實(shí)驗(yàn)結(jié)果進(jìn)行分析總結(jié),得出泄漏光功率隨腐蝕時間的變化關(guān)系以及泄漏光功率與包層剩余厚度和腐蝕長度的關(guān)系。